发明名称 Surface treatment system and method
摘要 A surface treatment system is disclosed to form a deposition layer at a surface of an object of surface treatment by using a deposition reaction in which an electrode (110) for applying power to form a deposition reaction in the deposition chamber (100) is installed between an inner wall (120) of the deposition chamber (100) and an object of surface treatment (900) and further includes a cooling unit (200) installed at the inner wall (120) of the deposition chamber (100) facing the electrode (110) and cooling ambient thereof.
申请公布号 US2005016455(A1) 申请公布日期 2005.01.27
申请号 US20040485900 申请日期 2004.08.05
申请人 CHO CHEON-SOO;YOUN DONG-SIK;LEE HYUN-WOOK;HA SAMCHUL 发明人 CHO CHEON-SOO;YOUN DONG-SIK;LEE HYUN-WOOK;HA SAMCHUL
分类号 C23C16/44;C23C16/50;(IPC1-7):C23C16/00 主分类号 C23C16/44
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