发明名称 |
Surface treatment system and method |
摘要 |
A surface treatment system is disclosed to form a deposition layer at a surface of an object of surface treatment by using a deposition reaction in which an electrode (110) for applying power to form a deposition reaction in the deposition chamber (100) is installed between an inner wall (120) of the deposition chamber (100) and an object of surface treatment (900) and further includes a cooling unit (200) installed at the inner wall (120) of the deposition chamber (100) facing the electrode (110) and cooling ambient thereof.
|
申请公布号 |
US2005016455(A1) |
申请公布日期 |
2005.01.27 |
申请号 |
US20040485900 |
申请日期 |
2004.08.05 |
申请人 |
CHO CHEON-SOO;YOUN DONG-SIK;LEE HYUN-WOOK;HA SAMCHUL |
发明人 |
CHO CHEON-SOO;YOUN DONG-SIK;LEE HYUN-WOOK;HA SAMCHUL |
分类号 |
C23C16/44;C23C16/50;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|