发明名称 Alignment and correction template for optical profilometric measurement
摘要 An electronic template delineating distinct selected patterns corresponding to predetermined regions of interest in a sample part is used to limit analysis to those regions. The surface of the sample is first measured using conventional techniques. The data so acquired are used to identify boundaries between distinct regions, which are then compared to a predetermined pattern boundary in the template to find a best-fit match. The position of the pattern is then shifted to overlay the match, thereby automatically aligning the template's selected patterns with the regions of interest in the sample surface. As a result, profilometric analysis can be limited to the regions of interest. Correction factors are also assigned to each selected pattern in the template to account for physical differences in the corresponding regions of interest of the sample part that affect the profilometric measurement.
申请公布号 US6847460(B2) 申请公布日期 2005.01.25
申请号 US20020262057 申请日期 2002.10.01
申请人 VEECO INSTRUMENTS, INC. 发明人 FARRELL COLIN T.;MARTINEZ ANTHONY L.;SCHMIT JOANNA;KRELL MICHAEL B.
分类号 G11B5/187;G11B5/455;G11B5/60;(IPC1-7):G02B9/02 主分类号 G11B5/187
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