| 摘要 |
PURPOSE: An organic anti-reflective coating composition and a method for forming a pattern of a semiconductor device using the same are provided to minimize the effect by post exposure delay as well as to minimize the distortion of pattern by diffused reflection. CONSTITUTION: The organic anti-reflective coating composition comprises a polymer of the formula 1, having a weight average molecular weight of 1,000-1,000,000; and any one material selected form the group consisting of a polymer of the formula 2, having a weight average molecular weight of 1,000-1,000,000, a polymer of the formula 3, having a weight average molecular weight of 1,000-1,000,000 and a mixture thereof. In the formulas 1-3, m and n are an integer of 5-5,000, p and q are an integer of 1-100, and each of R1 and R2 is the same and different, and represents hydrogen, an C1-C10 alkyl group or fluoroalkyl group. The method for forming a pattern comprises the steps of: applying a photoresist coating onto a semiconductor substrate having a predetermined substructure; applying the above organic anti-reflective coating composition onto the photoresist coating; and exposing and developing against the photoresist coating.
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