发明名称 METHOD FOR FABRICATING SEMICONDUCTOR DEVICE TO MAINTAIN AIRTIGHTNESS OF SPACE FORMED BY SEALING MEMBER AND SUBSTRATE
摘要 PURPOSE: A method for fabricating a semiconductor device is provided to maintain airtightness of a space formed by a sealing member and a substrate by preventing a bonding position between the sealing member and the substrate from being damaged. CONSTITUTION: A sealing member is bonded to a substrate(12) on which a semiconductor device is mounted to seal the semiconductor device. An opening is formed in the sealing member. The sealing member having the opening is bonded to the substrate. The opening is closed to seal the semiconductor device after the semiconductor device, the substrate and the sealing member are heated.
申请公布号 KR20050009666(A) 申请公布日期 2005.01.25
申请号 KR20040048821 申请日期 2004.06.28
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 KAZAMA, YOICHI;SHIRAISHI, SATOSHI
分类号 H01L27/14;G03B17/02;G03B19/02;H01L21/00;H01L21/50;H01L21/56;H01L23/00;H01L23/02;H01L27/146;H01L31/00;H01L31/02;H01L31/0203;H01L31/0232;H04N5/225;H04N5/335;(IPC1-7):H01L27/146 主分类号 H01L27/14
代理机构 代理人
主权项
地址
您可能感兴趣的专利