发明名称 System and method for multi-wavelength, narrow-bandwidth detection of surface defects
摘要 A system and method for detecting defects in surface structures, such as those formed on semiconductor wafers. A light source, preferably a strobe light, provides illumination that is separated by a filter into a plurality of selected bandwidths. The light then is transported through a fiber optic cable to a diffuser, and from there directed toward the surface. A camera captures a plurality of images, each image formed by a separate portion of the electromagnetic spectrum. The images may be formed by either reflected or diffracted light, or both. The images may be stored or compared to an image of a calibration wafer.
申请公布号 US6847443(B1) 申请公布日期 2005.01.25
申请号 US20020322582 申请日期 2002.12.18
申请人 RUDOLPH TECHNOLOGIES, INC. 发明人 HEROD DAVID W.;LIN YOULING
分类号 G01N21/88;G01N21/956;(IPC1-7):G01N21/88 主分类号 G01N21/88
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