发明名称 |
System and method for multi-wavelength, narrow-bandwidth detection of surface defects |
摘要 |
A system and method for detecting defects in surface structures, such as those formed on semiconductor wafers. A light source, preferably a strobe light, provides illumination that is separated by a filter into a plurality of selected bandwidths. The light then is transported through a fiber optic cable to a diffuser, and from there directed toward the surface. A camera captures a plurality of images, each image formed by a separate portion of the electromagnetic spectrum. The images may be formed by either reflected or diffracted light, or both. The images may be stored or compared to an image of a calibration wafer.
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申请公布号 |
US6847443(B1) |
申请公布日期 |
2005.01.25 |
申请号 |
US20020322582 |
申请日期 |
2002.12.18 |
申请人 |
RUDOLPH TECHNOLOGIES, INC. |
发明人 |
HEROD DAVID W.;LIN YOULING |
分类号 |
G01N21/88;G01N21/956;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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