发明名称 DRAM CELLS HAVING BAR-SHAPED STORAGE NODE CONTACT PLUGS FOR IMPROVING DRIVE PERFORMANCE THEREOF AND FABRICATING METHOD THEREOF
摘要 PURPOSE: DRAM cells having bar-shaped storage node contact plugs and a fabricating method thereof are provided to improve the drive performance thereof by overlapping storage node contact plugs on storage node holes of cell array regions. CONSTITUTION: A bit line interlayer dielectric(140) is formed on a semiconductor substrate(100). A bit line and a plurality of bit line patterns are laminated on the bit line interlayer dielectric. The bit line patterns are formed with bit line capping layer patterns. A plurality of bit line spacers are formed on sidewalls of the bit line patterns. A plurality of buried holes(150) are formed in a predetermined region of the bit line interlayer dielectric between the bit line patterns. A plurality of storage node contact plugs(159) are formed between the bit line patterns.
申请公布号 KR20050008226(A) 申请公布日期 2005.01.21
申请号 KR20030048082 申请日期 2003.07.14
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 BAE, JUN SHIK
分类号 H01L21/8242;H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L21/8242
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