发明名称 |
DRAM CELLS HAVING BAR-SHAPED STORAGE NODE CONTACT PLUGS FOR IMPROVING DRIVE PERFORMANCE THEREOF AND FABRICATING METHOD THEREOF |
摘要 |
PURPOSE: DRAM cells having bar-shaped storage node contact plugs and a fabricating method thereof are provided to improve the drive performance thereof by overlapping storage node contact plugs on storage node holes of cell array regions. CONSTITUTION: A bit line interlayer dielectric(140) is formed on a semiconductor substrate(100). A bit line and a plurality of bit line patterns are laminated on the bit line interlayer dielectric. The bit line patterns are formed with bit line capping layer patterns. A plurality of bit line spacers are formed on sidewalls of the bit line patterns. A plurality of buried holes(150) are formed in a predetermined region of the bit line interlayer dielectric between the bit line patterns. A plurality of storage node contact plugs(159) are formed between the bit line patterns.
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申请公布号 |
KR20050008226(A) |
申请公布日期 |
2005.01.21 |
申请号 |
KR20030048082 |
申请日期 |
2003.07.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAE, JUN SHIK |
分类号 |
H01L21/8242;H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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