| 摘要 |
PROBLEM TO BE SOLVED: To provide a simple system and method for enclosing liquid between a projection optical system and a wafer in a liquid immersion photolithography system. SOLUTION: An exposure system having a projection optical system 100 for exposing a substrate 101 with electromagnetic radiation and converging electromagnetic radiation onto a substrate and a liquid supply system for providing liquid between the projection optical system 100 and the substrate 101 are provided and the projection optical system is positioned under the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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