发明名称 |
ROTATING TUBULAR SPUTTER TARGET ASSEMBLY |
摘要 |
<p>A target assembly is claimed for use in e.g. a magnetron deposition apparatus. The target assembly is characterised in that at least one of the functions - bearing of the tube, rotation of the tube, electrical contact, coolant sealing and vacuum sealing - is integrated into the tube itself. Such an assembly has the advantage that it better uses the vacuum space by reducing the volume incorporated by the end blocks. Due to the compactness of the assembly it can also be used in smaller scale installations where now only planar target assemblies can be used.</p> |
申请公布号 |
WO2005005682(A1) |
申请公布日期 |
2005.01.20 |
申请号 |
WO2004EP51247 |
申请日期 |
2004.06.25 |
申请人 |
BEKAERT ADVANCED COATINGS;CNOCKAERT, DIRK;DE BOSSCHER, WILMERT |
发明人 |
CNOCKAERT, DIRK;DE BOSSCHER, WILMERT |
分类号 |
C23C14/34;H01J37/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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