发明名称 ROTATING TUBULAR SPUTTER TARGET ASSEMBLY
摘要 <p>A target assembly is claimed for use in e.g. a magnetron deposition apparatus. The target assembly is characterised in that at least one of the functions - bearing of the tube, rotation of the tube, electrical contact, coolant sealing and vacuum sealing - is integrated into the tube itself. Such an assembly has the advantage that it better uses the vacuum space by reducing the volume incorporated by the end blocks. Due to the compactness of the assembly it can also be used in smaller scale installations where now only planar target assemblies can be used.</p>
申请公布号 WO2005005682(A1) 申请公布日期 2005.01.20
申请号 WO2004EP51247 申请日期 2004.06.25
申请人 BEKAERT ADVANCED COATINGS;CNOCKAERT, DIRK;DE BOSSCHER, WILMERT 发明人 CNOCKAERT, DIRK;DE BOSSCHER, WILMERT
分类号 C23C14/34;H01J37/34;(IPC1-7):C23C14/34 主分类号 C23C14/34
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