| 摘要 |
PROBLEM TO BE SOLVED: To provide a sealing assembly for sealing a slit. SOLUTION: The assembly is equipped with a sealing means extending toward mostly longitudinal direction of the slit in order to prevent particles from passing in slit transverse direction T at least partially, and the sealing means is equipped with a vacuum exhaust means 5. A lithography projection apparatus is provided with a substrate holder for supporting at least one substrate, a patternizing means for patterning a projection beam according to a desired pattern, and at least one vacuum chamber including a projection means for projecting the above patterned projection beam at the target portion of the above substrate. Further, a device manufacturing method is also provided. COPYRIGHT: (C)2005,JPO&NCIPI |
