发明名称 DRY ETCHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a dry etching device, by which the occurrence of particles is prevented by early discovering the deterioration of a device part forming a surface protective film, an exchange cost is reduced, and a device operating-efficiency is improved. SOLUTION: A spectroscope 22 detecting the emission spectrum of aluminum as the base material of gaseous diffusion plates 6, a treating section 23 converting the emission spectrum intensity of the spectroscope 22 into a voltage, a deterioration detecting section 24 detecting the deterioration of the device part by comparing an output from the treating section 23 with a specified value, and a display section 25 displaying the exchange of the device part in response to an output from the detecting section 24, are newly installed on the output side of a view port 17 for detecting the deterioration of the gaseous diffusion plates 6. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005019763(A) 申请公布日期 2005.01.20
申请号 JP20030183703 申请日期 2003.06.27
申请人 NEC KANSAI LTD 发明人 ENDO MAKOTO
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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