发明名称 THIN FILM DEPOSITION METHOD, THIN FILM MANUFACTURING APPARATUS, AND THIN FILM DEPOSITED BODY
摘要 PROBLEM TO BE SOLVED: To provide a thin film deposition method, a thin film manufacturing apparatus, and a thin film deposited body in which a thin film of excellent water repellency and oil repellency can be deposited, and the film deposition efficiency is enhanced. SOLUTION: In the thin film deposition method, discharge gas is introduced in a discharge space and excited under atmospheric pressure or the pressure close to atmospheric pressure, the excited discharge gas is mixed with thin film deposition gas containing a raw material outside the discharge space to form secondary excitation gas, and a thin film is deposited on a base material by exposing the secondary excitation gas to the base material. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005015850(A) 申请公布日期 2005.01.20
申请号 JP20030182594 申请日期 2003.06.26
申请人 KONICA MINOLTA HOLDINGS INC 发明人 ARITA HIROAKI;KUDO KAZUYOSHI;SAITO ATSUSHI
分类号 C23C16/452;H01L21/205;(IPC1-7):C23C16/452 主分类号 C23C16/452
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