| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposited film formation apparatus and a deposited film formation method which realize remarkable reduction of the occurrence of spherical projections in deposited films, and reduction of unevenness in images and variation in electrical properties of the film. SOLUTION: In the deposited film formation apparatus and a deposited film formation method in which cylindrical substrates are evenly spaced on the same circumference, and high frequency electric power is introduced from the outside of the circle on which the cylindrical substrates are spaced, so that deposited films having satisfactory characteristics are formed on the plurality of substrates, the formation of the deposited films is performed in such a manner that a cylindrical member having an exhaust hole of a gaseous starting material at least in a part is set to the inside of the substrates spaced on the concentric circle. COPYRIGHT: (C)2005,JPO&NCIPI
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