| 摘要 |
PROBLEM TO BE SOLVED: To provide a deposited film formation device and a method therefor by which the characteristics of deposited films and productivity are made excellent, and particularly, the generation, e.g., of abnormal growth called as "spherical projections" occurring on the deposited films can be reduced. SOLUTION: The device comprises: a reaction vessel 101 permitting evacuation and in which at least a part is composed of a dielectric member; a plurality of cylindrical substrates 105 and gas feeding means 110 arranged at the inside of the reaction chamber 101; and a plurality of high frequency electrodes 102 arranged at the outside of the reaction vessel 101. In the device, high frequency electric power is applied to the high frequency electrodes 102, and glow discharge is generated inside the reaction chamber 101, so that a gaseous starting material introduced into the reaction vessel 101 is decomposed to form deposited films on the plurality of cylindrical substrates 105. The device further comprises a cylindrical metallic member 111 arranged almost on the center of the reaction vessel 101 so as to be floated from the reaction vessel 101. COPYRIGHT: (C)2005,JPO&NCIPI
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