发明名称 |
METHOD FOR MANUFACTURING SINGLE CRYSTAL, AND SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a single crystal, in which the single crystal having a desired defect area can be efficiently manufactured in a short time at a high yield by controlling the ratio V/G by controlling change of the crystal temperature gradient G during pulling the single crystal without reducing the pulling speed V when the single crystal is grown by a Czochralski (CZ) method. SOLUTION: In the method for manufacturing the single crystal by pulling it from a raw material melt by the CZ method, when the pulling speed at the time of growing the constant diameter part of the single crystal is expressed as V (mm/min) and the crystal temperature gradient in the pulling-axis direction in the vicinity of the solid-liquid interface is expressed as G (°C/mm) when growing the single crystal, the ratio V/G (mm<SP>2</SP>/°C×min) of the pulling speed V to the crystal temperature gradient G is controlled by controlling the crystal temperature gradient G by changing the position of a heater for heating the raw material melt so that the single crystal having the desired defect area can be grown. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005015288(A) |
申请公布日期 |
2005.01.20 |
申请号 |
JP20030183676 |
申请日期 |
2003.06.27 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
IIDA MAKOTO;SAKURADA MASAHIRO;MITAMURA NOBUAKI |
分类号 |
C30B15/20;C30B29/06;(IPC1-7):C30B15/20 |
主分类号 |
C30B15/20 |
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