Ceramic substrate for semiconductor manufacture/inspection apparatus, ceramic heater, electrostatic clampless holder, and substrate for wafer prober

摘要

The present invention provide a ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in alpha-rays radiated, and change of thermal conductivity with passage of the time, and which is superior in the temperature controllability. This invention is related to a ceramic substrate for apparatuses for use in semiconductor manufacture and/or inspection, wherein the level of alpha-rays radiated from said ceramic substrate exceeds 0.25 c/cm<2>.hr and is not higher than 50 c/cm<2>.hr.