| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a flow sensor for a non-dispersive infrared analyzer capable of stably measuring resistance of a hot wire resistance, and keeping a clean environment. <P>SOLUTION: A film having the thickness of 3-4 microns is formed on a substrate 1 from a nickel metal by a sputtering method. Patterning is performed on the formed nickel metal film by using a photolithographic technology, to thereby form a resist protective film. Then, the nickel metal film of a part where the resist protective film is not formed is etched by using nitric acid aqueous solution, to thereby form the hot wire resistance 5 and terminals 6a, 6b. As a mask used for a photolithograph, a mask having at least one pad part 7a, 7b on each terminal 6a, 6b after patterning is used. After patterning, the pad parts 7a, 7b are covered with silicone rubber or the like not corroded by the nitric acid aqueous solution, and then etching is performed. After etching, the silicone rubber is removed, to thereby form the pad parts 7a, 7b where the nickel metal is exposed. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
