MASK AND SEMICONDUCTOR DEVICE FABRICATED BY USING THE SAME TO EFFICIENTLY AND MAXIMUMLY USE SMALL SCRIBE SPACE

摘要

PURPOSE: A mask is provided to efficiently and maximumly use a small scribe space by repeatedly using mark that is used to measure an overlay degree between an initial process pattern and an after process pattern. CONSTITUTION: A mask for an initial process is fabricated which includes a plurality of marks used in an initial process. A mask for an after process is fabricated in a manner that at least one of a plurality of marks used in an after process overlaps the mark of the initial process mask. A mark of the initial process mask used in an ion implantation process overlaps a mark of the after process mask used in a metal pattern.