| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of inspecting and cleaning a mask, which efficiently detects and removes foreign matters adhering on a reticle. <P>SOLUTION: A mask inspecting and cleaning apparatus 50 is provided with a light source 51 that irradiates a reticle 21 with a pulsed laser light, and a means 53 for adjusting the light intensity of the pulsed laser light. In inspecting the reticle 21, the reticle 21 is irradiated with a pulsed laser light whose intensity is reduced by a light-quantity adjustment mechanism 53, and the transmitted light or the reflected light is detected and analyzed to detect adhesion of foreign matters. In cleaning, the reticle 21 is irradiated with a relatively strong pulsed laser light from the light source 51 to remove foreign matters from the reticle surface. Thereby, the inspection and cleaning of the reticle are carried out with a sequence of works, and the working time is shortened. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
