发明名称 LINEAR EVAPORATION SOURCE AND DEPOSITION APPARATUS USING THE SAME TO IMPROVE EFFICIENCY OF APPARATUS
摘要 PURPOSE: A deposition apparatus using a linear evaporation source is provided to improve efficiency of an apparatus by improving thickness uniformity of a thin film and by miniaturizing and simplifying a deposition apparatus. CONSTITUTION: A deposition material is contained in an inner skin of a long case type, and an opening is formed in the upper part of the inner skin. The inner skin is inserted into a crucible. A slit(24) whose width becomes smaller as it goes to its center is formed in a longitudinal side surface of the crucible. A heat generating part is formed in an outer skin surrounding the crucible. The outer skin is fixed to a linear evaporation source(2) composed of a rotation control apparatus(25) capable of rotating an evaporation source. The linear evaporation source is positioned in the center of the side surface of a vertically fixed substrate(3). The evaporation source is vertically tilted by using the length direction of the evaporation source as an axis to deposit the deposition material while the discharge direction of the deposition material is varied.
申请公布号 KR100467535(B1) 申请公布日期 2005.01.13
申请号 KR20040016590 申请日期 2004.03.11
申请人 YAS CO., LTD. 发明人 JEONG, KWANG HO;KIM, SEONG MOON;CHOI, MYUNG WOON
分类号 H01L21/20;(IPC1-7):H01L21/20 主分类号 H01L21/20
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