POSITIVE TYPE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN FROM THE SAME

摘要

A positive type resist composition which comprises a resin ingredient (A) which comes to have enhanced alkali solubility by the action of an acid, an acid generator ingredient (B) which generates an acid upon exposure to light, and an organic solvent (C). The ingredient (A) has (i) a structural unit (a1) which contains an acid-dissociable dissolution-inhibitive group and is derived from a (meth)acrylic ester, (ii) a structural unit (a2) which contains an acid-dissociable dissolution-inhibitive group less dissociable than the acid-dissociable dissolution-inhibitive group contained in the structural unit (a1) and is derived from a (meth)acrylic ester, and (iii) a structural unit (a3) which contains a functional lactone group and is derived from a (meth)acrylic ester.