发明名称 |
METALLIC STRUCTURE AND METHOD FOR PRODUCING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To produce a metallic structure exhibiting less embrittlement and improved creeping resistance as well as inherent hardness. SOLUTION: The metallic structure shows less embrittlement and excellent hardness and creeping resistance and is annealed at a temperature equal to or lower than the temperature at which the crystals of the metallic material grow. In one embodiment, the metallic structure is made from at least two types of metallic materials and is annealed at a temperature equal to or lower than the temperature at which the crystal of the metallic materials grow. This structure is very effective in an embodiment of a fine structure such as a contact probe. The production method is for producing a metallic structure showing less embrittlement and excellent hardness and creeping resistance and comprises the step of annealing a metallic material at a temperature equal to or lower than the temperature at which the crystals of the metallic material grow. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005008986(A) |
申请公布日期 |
2005.01.13 |
申请号 |
JP20040217072 |
申请日期 |
2004.07.26 |
申请人 |
SUMITOMO ELECTRIC IND LTD;JAPAN ELECTRONIC MATERIALS CORP |
发明人 |
OKADA KAZUNORI;HIRATA YOSHIHIRO;INASAWA SHINJI;SAKUTA MASAO;TANI YOSHIAKI;SAKATA TERUHISA |
分类号 |
G01R1/067;C21D6/00;C22F1/00;C22F1/04;C22F1/08;C22F1/10;C22F1/11;C22F1/14;C22F1/16;C22F1/18;(IPC1-7):C22F1/10 |
主分类号 |
G01R1/067 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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