| 发明名称 |
REFLECTOR TYPE MASK AND ALIGNER |
| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To increase a degree of freedom in spatial designing of an illumination optical system and a projection optical system in an EUV aligner. <P>SOLUTION: A mask alignment mark of a reflector mask is formed on the opposite side from a circuit pattern-formed side of the mask, and an alignment detection system is installed on the opposite side of the illumination optical system and the projection optical system with respect to the mask. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
| 申请公布号 |
JP2005011914(A) |
申请公布日期 |
2005.01.13 |
| 申请号 |
JP20030172863 |
申请日期 |
2003.06.18 |
| 申请人 |
CANON INC |
发明人 |
SAKAMOTO EIJI;MATSUI SHIN |
| 分类号 |
G03F1/22;G03F1/24;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
G03F1/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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