| 摘要 |
High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99.995%, and more preferably at least 99.999%. In addition, tantalum metal and alloys thereof are described, which have a texture and which an (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about -4.0 or combinations of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers and wire. Also disclosed is a process for making a sputtering target comprising tantalum metal. |
