PATTERNING PROCESS OF NANOPARTICLES AND SINTERED PRODUCTS OF PATTERNED NANOPARTICLES

摘要

PURPOSE: A high-efficiency patterning process of nanoparticles is provided to reduce noise particles deposited on the outside of a pattern, and improve productivity and reproducibility. Also, the patterned nanoparticle assemblies are sintered to produce critical dimension control. CONSTITUTION: The patterning process of nanoparticles comprises the steps of: (i) preparing bipolar charged polydisperse nanoparticles generated from evaporation and condensation method; (ii) extracting monodisperse nanoparticles having a desirable size by regulating the center electrode of differential mobility analyzer(DMA); (iii) placing a photoresist patterned substrate for deposition to the center electrode of electro-static precipitator(ESP) and applying voltage to the center electrode, ranging from -10 to +10kV; (iv) injecting charged monodisperse nanoparticles into ESP and depositing charged nanoparticles on the substrate due to electric field between center electrode and applied to voltage; (v) removing the photoresist pattern on the substrate. The nanoparticle assemblies in a patterned manner on the substrate are thermal treated at 200-300deg.C for 100-150min.