LITHOGRAPHIC DEVICE INCLUDING AN EXPOSURE SYSTEM AND A MEASUREMENT SYSTEM, AND DEVICE MANUFACTURING METHOD

摘要

PURPOSE: A lithographic device and a device manufacturing method are provided to enhance accuracy by compensating an error caused by a displacement of air due to a movement of a movable part thereof. CONSTITUTION: An exposure system(2) includes a radiation system(4) for providing a beam of radiation, a support structure for supporting a patterning device, a first substrate table(7) for holding a first substrate, and a projection system(9) for projecting the patterned beam onto a target part of the first substrate. The projection system includes a projection controller for controlling the projection onto the target position of the first substrate. The exposure system further includes a first controller(10) for moving a movable part of the exposure system. A measurement system(3) includes an optical measurement device for projecting a measurement beam to measure a surface property of a target portion of a second substrate, a second substrate table(14) for holding the second substrate, and a second controller(15) for moving a movable part of the measurement system.