发明名称 APPARATUS FOR DRYING A SUBSTRATE, PARTICULARLY CONCERNED WITH SIMULTANEOUSLY REDUCING THE SIZE OF A CLEANING EQUIPMENT AND IMPROVING DRYING PERFORMANCE
摘要 PURPOSE: An apparatus for drying a substrate is provided to simultaneously reduce the size of a cleaning equipment and improve drying performance by bending a main air knife to form at least one convex portion and installing a sub-air knife for jetting air at the convex portion of the bent main air knife. CONSTITUTION: A main air knife(1) for jetting air is disposed over or under a substrate(G), wherein the main air knife is bent to form a convex portion(1a). The bent main air knife has arm portions of which length directions slope with respect to transfer direction of the substrate. A sub-air knife(3) is installed at the convex portion of the main air knife to jet air at the substrate. When the main air knife is bent at two or more portions, the main air knife has two or more convex portions and one or more concave portions. Herein, two or more sub-air knifes are installed at the convex portions and one or more sucking elements for sucking a cleaning solution are installed at the concave portions.
申请公布号 KR20050004672(A) 申请公布日期 2005.01.12
申请号 KR20030044938 申请日期 2003.07.03
申请人 DMS CO., LTD. 发明人 PARK, YONG SEOK
分类号 G02F1/13;(IPC1-7):G02F1/13 主分类号 G02F1/13
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