发明名称 |
Detecting erosion in collector optics with plasma sources in extreme ultraviolet (EUV) lithography systems |
摘要 |
An embodiment of the present invention includes a technique to detect erosion in an extreme ultra violet (EUV) source collector system. An initial impedance and a coating impedance of a multi-layer (ML) coating of the collector in one of an extreme ultra violet lithography (EUVL) stepper and an optical system are obtained at first and second time instants. A relation between the coating and initial impedances is generated. An erosion rate of the ML coating is determined based on the relation.
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申请公布号 |
US6841322(B1) |
申请公布日期 |
2005.01.11 |
申请号 |
US20030611069 |
申请日期 |
2003.06.30 |
申请人 |
INTEL CORPORATION |
发明人 |
LEE SANG HUN |
分类号 |
G01N27/00;G01R27/08;G03C5/00;G03F7/20;G06F19/00;(IPC1-7):G03C5/00 |
主分类号 |
G01N27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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