METHOD OF MANUFACTURING MICRO-CHIP FOR IMPROVING APPLICABILITY OF ORGANIC SOLVENT AND ENHANCING DETECTABLE LIMIT IN PARTICULAR REACTION AND ITS ANALYZING PROCESS

摘要

PURPOSE: A method of manufacturing a micro-chip is provided to improve the applicability of an organic solvent and to enhance a detectable limit in a particular reaction and its analyzing process by coating an SiO2 thin film on an inner wall of a channel of a lap-on-a-chip. CONSTITUTION: Soft-baking is performed on a negative photoresist layer of a wafer. A photomask is arranged on the resultant structure and an exposure is performed thereon by using UV(UltraViolet) rays. By developing the photoresist layer, an embossed frame is completed. PDMS(Poly DiMethyl Siloxane) is injected to the embossed frame and harden, so that a PDMS part with a channel is formed. By forming a first SiO2 thin film(15) on an inner wall of the channel, a micro-chip upper part(17) is completed. A micro-chip lower part with a second SiO2 thin film corresponding to the channel is formed. A micro-chip is completed by attaching the micro-chip upper part to the micro-chip lower part.