REPROCESSING METHOD OF ISOLATION LAYER USING SC1 SOLUTION FOR REMOVING EFFICIENTLY PARTICLES FROM LINER OXIDE LAYER AND SUPPRESSING VOIDS

摘要

PURPOSE: A reprocessing method of an isolation layer is provided to remove efficiently particles from a liner oxide layer and to suppress simultaneously voids by using an SC1 solution instead of DI(DeIonized) water. CONSTITUTION: A pad oxide layer and a nitride layer are sequentially deposited on a substrate and patterned. A trench is formed by etching selectively the substrate. A liner oxide layer is formed on an inner wall of the trench by using a heat treatment. A cleaning process for removing particles from the liner oxide layer is performed on the resultant structure using an SC1 solution. A gap-filling process is performed for the trench.