发明名称 Method for forming correction pattern, liquid ejecting apparatus, and correction pattern
摘要 A correction-pattern forming method, for example, for forming a correction pattern with which it is possible to precisely correct discrepancies between dot formation positions in the moving direction is achieved. A correction-pattern forming method for forming a correction pattern on a medium, comprises: a step of moving a nozzle row in which a plurality of nozzles for ejecting a liquid to form dots on a medium are arranged in a row; and a step of forming a correction pattern that has a difference in darkness in a moving direction of the nozzle row and that is for correcting a discrepancy between dot formation positions in the moving direction by causing at least two nozzles, among the plurality of nozzles, in the nozzle row to eject the liquid at a different timing for each nozzle.
申请公布号 US2005001870(A1) 申请公布日期 2005.01.06
申请号 US20040834374 申请日期 2004.04.29
申请人 SEIKO EPSON CORPORATION 发明人 KOMATSU SHINYA
分类号 B41J2/01;B41J29/393;(IPC1-7):B41J29/393 主分类号 B41J2/01
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