| 摘要 |
PROBLEM TO BE SOLVED: To measure a variation in height of a stage by an interferometer system and to hold flexibility in disposing a moving mirror, etc. for other interferometer high. SOLUTION: A method for manufacturing a device includes a step of placing a wafer stage 12 movably on a wafer base 14, installing a wafer table 11 for holding a wafer W on the wafer stage 12 via Z-axis actuators 13A, 13B, 13C, and transferring of a pattern of a reticle R on the wafer W via a projection optical system PL. The method also includes a step of installing a prism 20A with its back surface as a reflecting surface at the side face of the wafer table 11, and installing a moving mirror 21X on the prism 20A. The position of an X direction of the wafer table 11 is measured by an X-axis laser interferometer 23X and the moving mirror 21X. A displacement of the prism 20A in a Z direction is measured by a Z-axis laser interferometer 22A, the prism 20A and a fixed mirror 24A for reflecting the laser beam LA reflected upward by the prism 20A in an incident direction and returning the laser beam LA. COPYRIGHT: (C)2005,JPO&NCIPI |
