Stage apparatus, static pressure bearing apparatus, positioning method, exposure apparatus and method for manufacturing device

摘要

Using a conductive material having volume resistance of approximately 1E<-3 >Omega.cm or above for a movable guide 3 axially supported by a static pressure bearing 10 makes it possible to sufficiently reduce deflection of beams caused by eddy current generated due to a leaked magnetic field from an electron lens of an electron beam exposure apparatus or deflection of beams due to the influences from increased charge by secondary electrons.