| 摘要 |
PROBLEM TO BE SOLVED: To provide annealing device/method of rapid energy transmission with which a large area can easily be manufactured, a thin film layer is rapidly crystallized and damage due to high heat of a substrate can be prevented. SOLUTION: The device is provided with an optical source unit which rapidly supplies light wave energy; an energy unit of a light reception means which rapidly absorbs wavelength energy of an optical source and in which a temperature rapidly rises; the substrate; an annealing unit that is provided with an amorphous thin film layer which is deposited on the substrate, is confronted with the energy unit, is detached by an appropriate distance, moves by a transportation unit, heats the amorphous thin film layer in order by heat energy which the energy unit discharges, and converts it into a polycrystalline thin film layer; and a radiation unit which is confronted with the substrate by the appropriate distance. Fixed mediums or gas mediums exist between the energy unit and the annealing unit, and between the annealing unit and the radiation unit. The annealing device is provided with a heat insulation layer arranged between the substrate and the amorphous thin film, the radiation layer arranged on a substrate on the other side or the amorphous thin film, a heat conducting layer disposed between the substrate and the heat insulation layer, and a heat reception layer installed on an amorphous thin film layer on the other side of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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