<p>An end-capped polybenzoxazole precursor having acid labile functional groups, positive working photosensitive compositions thereof and use of the compositions for producing heat resistant relief images on substrates.</p>
申请公布号
WO2005000912(A2)
申请公布日期
2005.01.06
申请号
WO2004US17536
申请日期
2004.06.03
申请人
ARCH SPECIALTY CHEMICALS, INC.
发明人
RUSHKIN, IILYA;NAIINI, AHMAD, A.;HOPLA, RICHARD;WATERSON, PAMELA, J.;WEBER, WILLIAM, D.
