MASK ARRANGED AT END POINTS OF CELL REGION FOR FORMING BUTTING VERNIER

摘要

PURPOSE: A mask for forming a butting vernier is provided to feedback a subtle distortion of exposure equipment by designing the mask to be arranged at end points of a cell region rather than up/down/left/right directions. CONSTITUTION: A mask is used to form a butting vernier which is used to detect an accuracy of a stage(40) at an initial exposure. The mask includes a first mask pattern for forming an outer vernier and a second mask pattern(42) for forming an inner vernier. The first mask pattern and the second mask pattern are sequentially formed at each of regions corresponding to exteriors of edges of a cell and are spaced from each other in a diagonal direction.