| 摘要 |
PURPOSE: Provided is a mask for use in a gradual stitching exposure process, which minimizes defects resulting from generation of unexposed zones to improve the reliability of a member to be exposed, such as a substrate for LCD devices, and to increase production efficiency. CONSTITUTION: The mask(1a) for use in a gradual stitching exposure process comprises an exposure section(20a) provided with a masking pattern(22a) for forming a pattern on a shot(1s) exposed on a member to be exposed, and a light-shielding section(10a) provided with a light-shielding block(12a,14a) for preventing another shot adjacent to the above exposed shot from being subjected to exposure, wherein the light-shielding section(10a) is provided so that the light-shielding blocks(14a) adjacent and facing to each other can be formed integrally. |
