MASK CAPABLE OF ENLARGING FOCUS MARGIN OF LASER ILLUMINATION DEVICE AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A mask and a manufacturing method thereof are provided to enlarge a focus margin of a laser illumination device by reducing a variation of light intensity on patterns at an edge portion. CONSTITUTION: A mask includes a transparent substrate(100), a main pattern region(A1), and a fantom pattern region(B1). The main pattern region is formed on the transparent substrate and includes main light blocking layers(112a) and a main light transmissive layer(112b) between the main light blocking layers. The fantom pattern region is formed on the transparent substrate and includes a fantom light blocking layer(114a) having a pitch and a shape same to those of the main light blocking layer and a fantom light transmissive layer(114b) having a pitch smaller than that of the main light transmissive layer.