发明名称 Methods of forming memory devices and memory cell constructions
摘要 The invention pertains to thin film constructions comprising NVRAM devices built over a versatile substrate base. In particular aspects, a device includes a body region, and further include first and second diffusion regions formed in the body region. A channel region is in the body region between the first and second diffusion regions. A gate insulator stack is above the channel region, and a gate is over the gate insulator stack. The gate insulator stack includes a floating plate charge center which is electrically connected to the second diffusion region. The memory device includes a diode which connects the body region to the second diffusion region such that the floating plate is charged when the diode is reversed biased. The invention also includes electronic systems comprising novel TFT-based NVRAM devices.
申请公布号 US2004262667(A1) 申请公布日期 2004.12.30
申请号 US20040892340 申请日期 2004.07.14
申请人 BHATTACHARYYA ARUP 发明人 BHATTACHARYYA ARUP
分类号 G11C16/04;H01L21/336;H01L21/8246;H01L21/8247;H01L21/84;H01L27/115;H01L27/12;H01L29/10;H01L29/423;H01L29/786;H01L29/788;(IPC1-7):H01L29/76 主分类号 G11C16/04
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