发明名称 System and method for inductive coupling of an expanding thermal plasma
摘要 A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma, and expanding and inductively coupling the generated plasma. In another embodiment a plasma generation system is provided including a plasma generation apparatus for generating thermal plasma. The thermal plasma is received by a plasma treatment chamber external to the plasma generation apparatus. A pressure control system maintains a lower pressure in the plasma treatment chamber than in the plasma generation apparatus during plasma generation for causing the thermal plasma to expand within the plasma treatment chamber. An inductor system inductively couples the thermal plasma.
申请公布号 US2004263083(A1) 申请公布日期 2004.12.30
申请号 US20030609958 申请日期 2003.06.30
申请人 SCHAEPKENS MARC 发明人 SCHAEPKENS MARC
分类号 C23C16/00;H01J7/24;H01J37/32;H05H1/46;(IPC1-7):H01J7/24 主分类号 C23C16/00
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