发明名称 METHOD OF FORMING AN INTEGRATED CIRCUIT SUBSTRATE
摘要 A method of forming an integrated circuit substrate that may be adapted to be attached to one or more electronic components. The method includes applying a resist to a back side of a substrate which includes patterned conductive layers on a front side and a back side of the substrate. The method further includes removing part of the patterned conductive layer from the front side of the substrate to form pads and interconnects on the front side of the substrate and applying another resist to the front side of the substrate. The method also includes forming a pattern in each resist that exposes the pads on the front and back sides of the substrate and applying electrolytic nickel to the pads on the substrate.
申请公布号 US2004266070(A1) 申请公布日期 2004.12.30
申请号 US20030612282 申请日期 2003.06.30
申请人 GURUMURTHY CHARAN K.;AZIMI HAMID;LIN ARTHUR K. 发明人 GURUMURTHY CHARAN K.;AZIMI HAMID;LIN ARTHUR K.
分类号 H01L21/48;H05K3/10;H05K3/24;H05K3/46;(IPC1-7):H01L21/44 主分类号 H01L21/48
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