| 摘要 |
A gas injector for supplying gas into a reaction chamber, in which a substrate is placed, including a main supply tube extending through the reaction chamber such that an outlet end of the main supply tube is positioned in the interior of the reaction chamber, branch tubes branched from the outlet end of the main supply tube, and injector port members connected to respective outlet ends of the branch tubes. Gas from an external gas supply source is supplied into the main supply tube. Each injector port member has a plurality of nozzle holes. Since gas is distributed through the branch tubes, and is then injected through the nozzle holes provided at each injector port member, it is possible to achieve uniform gas injection, and thus, to achieve an improvement in process uniformity.
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