| 发明名称 |
Micro device and process for producing it |
| 摘要 |
A micro device comprising a SU-8 photoresist layer adhered to a thin layer of, for example, silicon nitride, silicon oxide, metal, and diamond. The SU-8 layer is clamped on the thin layer by using an under-etching technique.
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| 申请公布号 |
US2004266049(A1) |
申请公布日期 |
2004.12.30 |
| 申请号 |
US20030631421 |
申请日期 |
2003.07.30 |
| 申请人 |
DETTERBECK MANFRED;LUTTER STEFAN;BURRI MATHIEU;HARTMANN THEO;AKIYAMA TERUNOBU |
发明人 |
DETTERBECK MANFRED;LUTTER STEFAN;BURRI MATHIEU;HARTMANN THEO;AKIYAMA TERUNOBU |
| 分类号 |
B81C1/00;B81B3/00;C23F1/40;G03F7/00;G03F7/16;(IPC1-7):H01L21/00 |
主分类号 |
B81C1/00 |
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