发明名称 Method for forming a recognition mark on a substrate for a KGD
摘要 A method for forming a recognition mark on the back surface of a substrate for a KGD that can be easily produced at a low manufacturing cost and permits repeated use of a substrate is provided. In the method, wiring patterns are formed on a surface of one side of an insulating substrate. The method includes a step of forming a conductive pattern as a recognition mark on one surface where the wiring patterns are formed, and a step of forming a through hole from a surface where the wiring pattern is not formed toward the conductive pattern. In the substrate, bumps connected with the KGD are formed on the surface on which the wiring patterns are not formed. Also, the conductive pattern may have a shape as the recognition mark or the through hole may have the shape as the recognition mark.
申请公布号 US6835318(B2) 申请公布日期 2004.12.28
申请号 US20020067890 申请日期 2002.02.08
申请人 YAMAICHI ELECTRONICS CO., LTD. 发明人 SUZUKI TAKEYUKI;MATSUOKA NORIYUKI
分类号 G01R31/26;H01L23/544;H05K1/02;H05K1/11;H05K3/00;(IPC1-7):H01B13/00 主分类号 G01R31/26
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