发明名称 Chemical functionalization nanolithography
摘要 The present invention discloses devices and methods relating to patterning substrates using chemical functionalization. The methods include covering the surface of a substrate with a first plurality of molecules, selecting at least one internal bond from the plurality of molecules, and reacting the at least one internal bond to form at least one second functional group. Either or both of the functional groups can then be further reacted.
申请公布号 US6835534(B2) 申请公布日期 2004.12.28
申请号 US20010032649 申请日期 2001.10.26
申请人 THE PENN STATE RESEARCH FOUNDATION 发明人 WEISS PAUL S.;FUNK RAY L.
分类号 G01Q30/10;G03F7/00;G03F7/16;(IPC1-7):G03F7/00 主分类号 G01Q30/10
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