发明名称 Three-dimensional integrated CMOS-MEMS device and process for making the same
摘要 A vertically integrated structure includes a micro-electromechanical system (MEMS) and a chip for delivering signals to the MEMS. The MEMS has an anchor portion having a conductor therethrough, by which it is connected to a substrate. The chip is attached to the MEMS substrate in a direction normal to the substrate surface, so as to make a conductive path from the chip to the MEMS. The chip may be attached by bonding the conductor to C4 metal pads formed on the chip, or by bonding the conductor to metal studs on the chip. The MEMS substrate may be thinned before attachment to the chip, or may be removed from the underside of the MEMS. A temporary carrier plate is used to facilitate handling of the MEMS and alignment to the chip.
申请公布号 US6835589(B2) 申请公布日期 2004.12.28
申请号 US20020294140 申请日期 2002.11.14
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 POGGE H. BERNHARD;DESPONT MICHEL;DRECHSLER UTE;PRASAD CHANDRIKA;VETTIGER PETER;YU ROY
分类号 B81C3/00;H01L21/768;(IPC1-7):H01L21/00 主分类号 B81C3/00
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