发明名称 |
Method for forming a DMOS device and a DMOS device |
摘要 |
A method for forming an LDNMOS (1) and LDPMOS (2) in a CMOS process comprises forming the LDNMOS (1) and LDPMOS (2) to a stage where a gate (14) is laid down on a gate oxide layer (12) and a locos (9) is formed over the respective N and P-wells (4) and (5) of the LDNMOS (1) and LDPMOS (2). A P-body (15) is formed in the N-well (4) of the LDNMOS (1) by implanting a boron dopant in two stages, in the first stage at a first tilt angle (theta) of 45° for forming the P-body (15) beneath the gate (14) for determining the source/drain threshold voltage, and subsequently at a second tilt angle (phi) of 7° for extending the P-body (15) downwardly at (25) for determining the punchthrough breakdown voltage of the LDNMOS (1). The formation of an N-body (16) in a P-well (5) of the LDPMOS (2) is similar to the formation of the P-body (15) with the exception that the dopant is a phosphorous dopant. |
申请公布号 |
US6835627(B1) |
申请公布日期 |
2004.12.28 |
申请号 |
US20000480223 |
申请日期 |
2000.01.10 |
申请人 |
ANALOG DEVICES, INC. |
发明人 |
WHISTON SEAMUS PAUL;BAIN ANDREW DAVID |
分类号 |
H01L21/265;H01L21/336;H01L21/8238;H01L29/08;H01L29/78;(IPC1-7):H01L21/336 |
主分类号 |
H01L21/265 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|