发明名称 |
X-ray projection exposure apparatus and a device manufacturing method |
摘要 |
An exposure apparatus includes a chuck for holding an object and an optical system for directing light from a light source to the object held by the chuck. The optical system includes a multilayer film mirror which has a concave reflecting surface, wherein an area of contacting portions of the chuck is set so that the contact portions area of the chuck is at most 10% of an area of the object held by the chuck.
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申请公布号 |
US6836531(B2) |
申请公布日期 |
2004.12.28 |
申请号 |
US20030679278 |
申请日期 |
2003.10.07 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HARA SHINICHI;TSUKAMOTO MASAMI |
分类号 |
G21K5/02;G03F7/20;G21K5/10;H01L21/027;H01L21/683;(IPC1-7):G21K5/00 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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