| 发明名称 |
Positive photosensitive composition |
| 摘要 |
A positive photosensitive composition comprising a quinonediazide compound, a novolak resin, a compound reacting with the novolak resin by the action of an acid, and a compound generating an acid by heating.
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| 申请公布号 |
US2004259019(A1) |
申请公布日期 |
2004.12.23 |
| 申请号 |
US20040765843 |
申请日期 |
2004.01.29 |
| 申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
YAHAGI ISAO |
| 分类号 |
G03F7/004;G03C1/52;G03F7/022;G03F7/023;G03F7/20;G03F7/40;H01L21/02;H01L21/027;(IPC1-7):G03C1/52 |
主分类号 |
G03F7/004 |
| 代理机构 |
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代理人 |
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