发明名称 VACUUM-ASSISTED PAD CONDITIONING SYSTEM AND METHOD UTILIZING AN APERTURED CONDITIONING DISK
摘要 A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus.
申请公布号 WO2004112091(A2) 申请公布日期 2004.12.23
申请号 WO2004US16353 申请日期 2004.05.25
申请人 TBW INDUSTRIES, INC.;BENNER, STEPHEN, J. 发明人 BENNER, STEPHEN, J.
分类号 B24B53/00;B24B53/007;B24B53/013;B24B53/02;B24B57/00;H01L21/306 主分类号 B24B53/00
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