发明名称 |
VACUUM-ASSISTED PAD CONDITIONING SYSTEM AND METHOD UTILIZING AN APERTURED CONDITIONING DISK |
摘要 |
A method and apparatus for conditioning polishing pads that utilize an apertured conditioning disk for introducing operation-specific slurries, without the need for additional tooling, platens, and materials handling. The method and apparatus utilize a vacuum capability to pull waste material out of the conditioning pad and through the apertured conditioning disk to evacuate the apparatus through an outlet port, the apparatus may also include self-contained flushing means and a piezo-electric device for vibrating the pad conditioning apparatus. |
申请公布号 |
WO2004112091(A2) |
申请公布日期 |
2004.12.23 |
申请号 |
WO2004US16353 |
申请日期 |
2004.05.25 |
申请人 |
TBW INDUSTRIES, INC.;BENNER, STEPHEN, J. |
发明人 |
BENNER, STEPHEN, J. |
分类号 |
B24B53/00;B24B53/007;B24B53/013;B24B53/02;B24B57/00;H01L21/306 |
主分类号 |
B24B53/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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