发明名称 IMPURITY MEASURING METHOD AND DEVICE
摘要 <p>An impurity measuring device comprises a table (T) on which a sample (S) is placed with its fracture surface (h) upward, an illuminating means (7) for irradiating the fracture surface (h) with light (L) from a plurality of directions, an imaging means (10) for imaging the fracture surface (h) illuminated by the light (L), a dark and light coloring means for subjecting the imaged image to dark and light coloring, and a binarizing means for binarizing the image through comparison between the result of the dark and light coloring and a threshold value. Irradiating the fracture surface (h) with the light (L) from a plurality of directions ensures that the image obtained by imaging the fracture surface (h) is free from shading or optical irregularities due to minute irregularities in the fracture surface (h). Therefore, impurities in the sample (S) from the fracture surface (h) can be accurately detected by subjecting the image to dark and light coloring and binarization.</p>
申请公布号 WO2004111619(A1) 申请公布日期 2004.12.23
申请号 WO2004JP08318 申请日期 2004.06.14
申请人 NIPPON LIGHT METAL COMPANY,LTD.;TOYOTA JIDOSHA KABUSHIKI KAISHA;KURAMASU, YUKIO;NUKAMI, TETSUYA 发明人 KURAMASU, YUKIO;NUKAMI, TETSUYA
分类号 G01N21/88;G01N33/20;(IPC1-7):G01N21/17 主分类号 G01N21/88
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